Chemical vapor deposition (CVD) : methods and technologies

"Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by th...

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Bibliographic Details

Other Authors:	Karlsson, Levi (Editor)
Format:	Book
Language:	English
Published:	New York : Nova Science Publishers, 2021
Series:	Chemical engineering methods and technology
Genre/form:	kolektivní monografie
ISBN:	978-1-53619-949-9 978-1-53619-990-1
Subjects:	chemická technologie chemické procesy tenké vrstvy grafen materiály povrchové úpravy materiálů chemická depozice z plynné fáze (CVD) chemical vapor deposition (CVD)
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