Chemical vapor deposition (CVD) : methods and technologies
"Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by th...
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Médium: | Kniha |
Jazyk: | angličtina |
Vydáno: |
New York :
Nova Science Publishers,
2021
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Edice: | Chemical engineering methods and technology
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Žánr/forma: | kolektivní monografie |
ISBN: | 978-1-53619-949-9 978-1-53619-990-1 |
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001 | 001878648 | ||
003 | CZ PrSTK | ||
005 | 20230303132336.0 | ||
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020 | |a 978-1-53619-949-9 |q (vázáno) | ||
020 | |z 978-1-53619-990-1 |q (elektronická kniha) | ||
040 | |a DLC |b cze |c DLC |d DLC |d ABD025 |d ABA013 |e rda | ||
050 | 0 | |a TP156.V3 |b CH46 2021 | |
072 | 7 | |a 66 |x Chemický průmysl. Chemická technologie |2 Konspekt |9 19 | |
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080 | |a (048.8:082) |2 MRF | ||
245 | 0 | 0 | |a Chemical vapor deposition (CVD) : |b methods and technologies / |c Levi Karlsson editor |
264 | 1 | |a New York : |b Nova Science Publishers, |c [2021] | |
264 | 4 | |c ©2021 | |
300 | |a x, 208 stran : |b ilustrace (některé barevné) ; |c 24 cm | ||
336 | |a text |b txt |2 rdacontent | ||
338 | |a svazek |b nc |2 rdacarrier | ||
490 | 1 | |a Chemical engineering methods and technology | |
504 | |a Obsahuje bibliografii, bibliografické odkazy a rejstřík | ||
520 | |a "Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate."--Nakladatelská anotace | ||
650 | 0 | 7 | |a chemická technologie |x ch |7 psh6329 |2 psh |
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650 | 0 | 7 | |a grafen |x ch |7 psh13952 |2 psh |
650 | 0 | 7 | |a materiály |x ob |7 psh8021 |2 psh |
650 | 0 | 7 | |a povrchové úpravy materiálů |x sr |7 psh10873 |2 psh |
653 | 0 | |a chemická depozice z plynné fáze (CVD) | |
653 | 0 | |a chemical vapor deposition (CVD) | |
655 | 7 | |a kolektivní monografie |7 fd501537 |2 czenas | |
700 | 1 | |a Karlsson, Levi |4 edt | |
830 | 0 | |a Chemical engineering methods and technology | |
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