Chemical vapor deposition (CVD) : methods and technologies
"Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by th...
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| Médium: | Kniha |
| Jazyk: | angličtina |
| Vydáno: |
New York :
Nova Science Publishers,
2021
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| Edice: | Chemical engineering methods and technology
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| Žánr/forma: | kolektivní monografie |
| ISBN: | 978-1-53619-949-9 978-1-53619-990-1 |
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| Shrnutí: | "Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate."--Nakladatelská anotace |
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| Fyzický popis: | x, 208 stran : ilustrace (některé barevné) ; 24 cm |
| Bibliografie: | Obsahuje bibliografii, bibliografické odkazy a rejstřík |