Study of Au production in a plasma-sputter type negative ion source

Simple method of sheet plasma production for high current negative ion.
Autor: Uramoto, Joshin
Vydáno: (1982)

Simple method of sheet plasma production for high current negative ion.
Autor: Uramoto, Joshin
Vydáno: (1982)

Production of negative hydrogen ions in a large multicusp ion source with double-magnetic filter configuration
Vydáno: (1992)

Negative ions
Autor: Massey, Harrie Stewart Wilson, Sir
Vydáno: (1976)

Effect of argon additive in negative hydrogen ion sources
Vydáno: (2001)

Negative ions
Autor: Massey, H. S. W.
Vydáno: (1950)

Ion implantation, sputtering and their applications
Autor: Townsend, P. D.
Vydáno: (1976)

Formation of negative metal ions in a field-free plasma
Autor: Larsson, E.
Vydáno: (1969)

Effect of a converter electrode in a multicusp negative ion source
Vydáno: (1989)

Negative ions and the magnetron
Autor: Page, Francis Michael
Vydáno: (1969)

The Harwell R sputtered ion gun
Autor: Hill, K. J.
Vydáno: (1970)

Electron beam effect in the Uramoto-type sheet plasma as a H-/D- ion source of volume production
Autor: Uramoto, Jöshin
Vydáno: (1987)

Suppression of accelerated electrons in a high-current large negative ion source
Autor: Takeiri, Yasuhiko
Vydáno: (1996)

Modified sputter source for the MP tandem accelerator
Autor: Imahori, Y.
Vydáno: (1981)

Surface ionization - a study of thermal desorption of negative ions
Autor: Martenson, Mattias
Vydáno: (1985)

Theoretical prospects of negative ions
Vydáno: (2002)

Ion surface interraction sputtering and related phenomena
Autor: Behrisch, R. a kol.
Vydáno: (1974)

Development of the work function monitoring method for a converter of a negative ion source
Vydáno: (1988)

Development of a high-current hydrogen-negative ion source for LHD-NBI system
Autor: Takeiri, Yasuhiko
Vydáno: (1998)

A back-diffusion type source of monoenergetic ions
Autor: Honzawa, Tadao
Vydáno: (1971)

Long-pulse operation of a cesium-seeded high-current large negative ion source
Autor: Takeiri, Yasuhiko
Vydáno: (1997)

Comparison between Uramoto type and straight filament type sheet plasma as a volume produced H- ion source(II)
Autor: Uramoto, Joshin
Vydáno: (1988)

Comparison between Uramoto type and straight filanent type sheet plasmas as a volume produced H- Ion Source (I)
Autor: Uramoto, Joshin
Vydáno: (1988)

Experimental characterization of an overdense plasma in a compact ion source
Autor: Castro, G.

Development of an intense negative hydrogen ion source with a wide-range of external magnetic filter field
Autor: Takeiri, Yasuhiko
Vydáno: (1994)

Energy dependence of the yields of ion-induced sputtering of monatomic solids
Vydáno: (1983)

Reactive sputtering
Autor: Schwartz, N.
Vydáno: (1964)

On the mechanism of sputtering
Autor: Lehmann, Chr.
Vydáno: (1966)

Reconsideration of sheath related to negative ion extraction
Autor: Jimbo, Kouichi
Vydáno: (1984)

A theoretical study of ion plasma oscillations
Autor: Peterson, W. W.
Vydáno: (1960)

Production mechanism of negative pionlike particles in H2 gas discharge plasma
Autor: Uramoto, Joshin
Vydáno: (1996)

A negative halogen ion gun for low energies
Autor: Kashihira, N.
Vydáno: (1973)

Optimization of Cs deposition in the 1/3 scale hydrogen negative ion source for LHD-NBI system
Autor: Oka, Y.
Vydáno: (1999)

The velocity distribution of sputtered atoms for light-ion irradiation at low energies
Autor: Bay, Helge Lago
Vydáno: (1985)

Unified analytic formula for physical sputtering yield at normal ion incidence
Autor: Janev, R. K. (Ratko K.), 1939-
Vydáno: (2001)

Electron cyclotron resonance plasma enhanced sputtering at low pressures : A summary of thesis
Autor: Mišina, Martin
Vydáno: (1996)